Sputter deposition of anatase titanum dioxide transparent conducting films

Shinku/Journal of the Vacuum Society of Japan

Volumn 51, Issue 9, 2008, Pages 602-607

  Yamada, Naoomi ^a   Hitosugi, Taro ^a,b   Hasegawa, Tetsuya ^a,b  

^a KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE FILMS; ITO GLASS; NIOBIUM COMPOUNDS; OXIDE MINERALS; THIN FILMS; TITANIUM DIOXIDE; TRANSPORTATION ROUTES;

DEPOSITION CONDITIONS; MATERIAL PARAMETER; OXYGEN DEFICIENCY; RECENT PROGRESS; REDUCING ATMOSPHERE; TRANSPARENT CONDUCTING FILMS; TRANSPARENT CONDUCTORS; VISIBLE TRANSMITTANCE;

DEPOSITION;

EID: 57449117677     PISSN: 05598516     EISSN: None     Source Type: Journal    
DOI: 10.3131/jvsj2.51.602     Document Type: Article

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