Patterning of carbon nanotubes by material assisted laser ablation process

IEEE Transactions on Nanotechnology

Volumn 9, Issue 3, 2010, Pages 381-385

  Chae, Junghun ^a   Jain, Kanti ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

Carbon nanotube; Excimer laser; Material assisted laser ablation (MALA); Photoablation

Indexed keywords

CLEANING PROCESS; ELECTRONIC DEVICE; HIGH-THROUGHPUT; LASER PATTERNING; LAYER FORMATION; LOW ENERGIES; PATTERNING PROCESS; PHOTOABLATION; VOLUME FABRICATION;

CLEANING; EXCIMER LASERS; GAS LASERS; LASER ABLATION; LASER APPLICATIONS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; THERMOELECTRIC EQUIPMENT;

CARBON NANOTUBES;

EID: 77952664385     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2009.2029696     Document Type: Article

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