Large-area high-resolution lithography and photoablation systems for microelectronics and optoelectronics fabrication

Proceedings of the IEEE

Volumn 90, Issue 10, 2002, Pages 1681-1688

  Jain, Kanti ^a,b,c,d   Zemel, Marc ^b,e,f,g   Klosner, Marc ^b  

^a IEEE   (United States)

^b Anvik Corporation   (United States)

^c SPIE   (United States)

^d OPTICAL SOCIETY OF AMERICA   (United States)

^e Sigma Xi   (United States)

^f Tau Beta Pi   (United States)

^g Phi Beta Kappa ^*

Author keywords

Displays; Large area exposure; Lithography systems; Microelectromechanical systems; Microelectronics; Optoelectronics; Photoablation; Projection imaging; Seamless scanning

Indexed keywords

DISPLAY DEVICES; LITHOGRAPHY; OPTOELECTRONIC DEVICES; POLYMERS;

IMAGE RESOLUTION; LARGE-AREA EXPOSURE; LAYER TO LAYER ALIGNMENT; MICROELECTROMECHANICAL SYSTEMS; MICROSYSTEM DEVICES; PHOTOABLATION; PROJECTION IMAGING; PROJECTION LITHOGRAPHY SYSTEMS; SEAMLESS SCANNING;

MICROELECTRONICS;

EID: 0037800501     PISSN: 00189219     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPROC.2002.803662     Document Type: Review

References (7)

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