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Volumn 6911, Issue , 2008, Pages

Excimer laser projection photoablation and lift-off process for patterning of indium-tin-oxide for cost-effective fabrication of flat-panel displays

Author keywords

Excimer laser ablation; ITO patterning; Lift off; Low cost patterning; PDP; Photoablation; TFT LCD

Indexed keywords

LIQUID CRYSTAL DISPLAYS; PHOTORESISTS; SPUTTERING; SUBSTRATES;

EID: 43249113615     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.767827     Document Type: Conference Paper
Times cited : (5)

References (7)
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    • Tanaka, R.1    Takaoka, T.2    Arai, H.3    Iwai, Y.4
  • 2
    • 0001517650 scopus 로고    scopus 로고
    • High-speed maskless patterning of indium tin oxide thin films
    • O. Yavas and M. Takai, "High-speed maskless patterning of indium tin oxide thin films", Applied Physics Letters, 73(18), 2558-2560 (1998).
    • (1998) Applied Physics Letters , vol.73 , Issue.18 , pp. 2558-2560
    • Yavas, O.1    Takai, M.2
  • 3
    • 27744487568 scopus 로고    scopus 로고
    • Ultrafast laser ablation of indium tin oxide thin films for organic light-emitting diode application
    • M. Park, B. Chon, H. Kim J. Chae, D. Kim, J. Lee, H. Chu and H. Kim, "Ultrafast laser ablation of indium tin oxide thin films for organic light-emitting diode application", Optics and Lasers in Engineering, 44(2), 138-146 (2006).
    • (2006) Optics and Lasers in Engineering , vol.44 , Issue.2 , pp. 138-146
    • Park, M.1    Chon, B.2    Kim, H.3    Chae, J.4    Kim, D.5    Lee, J.6    Chu, H.7    Kim, H.8
  • 4
    • 33846950176 scopus 로고    scopus 로고
    • Laser crystallization of hydrogenated amorphous silicon
    • N. H. Nickel, K. Brendel and R. Saleh, "Laser crystallization of hydrogenated amorphous silicon", Phys. Status Solidi C, n5, 1154-1168 (2004).
    • (2004) Phys. Status Solidi C , Issue.N5 , pp. 1154-1168
    • Nickel, N.H.1    Brendel, K.2    Saleh, R.3
  • 5
    • 0036386045 scopus 로고    scopus 로고
    • Characterization of modified surface of indium tin oxide film during process of laser patterning
    • J. N. Zeng, H. L. Koh, Z. M. Ren, W. D. Song and Y. F. Lu, "Characterization of modified surface of indium tin oxide film during process of laser patterning", Proc. SPIE, Vol. 4426, 268-271, (2002).
    • (2002) Proc. SPIE , vol.4426 , pp. 268-271
    • Zeng, J.N.1    Koh, H.L.2    Ren, Z.M.3    Song, W.D.4    Lu, Y.F.5
  • 6
    • 0032625361 scopus 로고    scopus 로고
    • Excimer laser ablation removal of chromium films from glass substrates
    • S. K. Lee, K. K. Yoon, K. H. Whang and S. J. Na, "Excimer laser ablation removal of chromium films from glass substrates, Surf. & Coat. Tech., Vol. 113, 63-74 (1999).
    • (1999) Surf. & Coat. Tech , vol.113 , pp. 63-74
    • Lee, S.K.1    Yoon, K.K.2    Whang, K.H.3    Na, S.J.4
  • 7
    • 0035772503 scopus 로고    scopus 로고
    • Excimer laser patterning of TiN film from metal sacrificial layers
    • A. Dowling, M. Ghantasala, J. Hayes, E. Harvey and D. Doyle, "Excimer laser patterning of TiN film from metal sacrificial layers", Proc. SPIE, Vol. 4592, 481-488 (2001).
    • (2001) Proc. SPIE , vol.4592 , pp. 481-488
    • Dowling, A.1    Ghantasala, M.2    Hayes, J.3    Harvey, E.4    Doyle, D.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.