Patterning of single walled carbon nanotubes using a low-fluence excimer laser photoablation process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7037, Issue , 2008, Pages

  Chae, Junghun ^a   Ho, Xinning ^a   Rogers, John A ^a,b   Jain, Kanti ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Carbon nanotubes; Excimer laser; Patterning; Photoablation; Photoablation assistor

Indexed keywords

ABLATION; APPLICATIONS; CARBON; CARBON FILMS; CHARGE COUPLED DEVICES; EXCIMER LASERS; FABRICATION; GAS LASERS; LASERS; LOGIC CIRCUITS; METALLIC COMPOUNDS; MICROELECTRONIC PROCESSING; MOS DEVICES; NANOCOMPOSITES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOTUBES; OPTOELECTRONIC DEVICES; OXIDE MINERALS; PHOTORESISTORS; PHOTORESISTS; POROUS MATERIALS; QUARTZ; SEMICONDUCTOR LASERS; SEMICONDUCTOR MATERIALS; SINGLE-WALLED CARBON NANOTUBES (SWCN); SURFACE TREATMENT;

CMOS (COMPLEMENTARY METAL OXIDE SEMICONDUCTOR); CMOS PROCESSES; COMPONENT MATERIALS; DIRECT ABLATIONS; EXCIMER; FLUENCE; INCIDENT ENERGIES; LASER PHOTOABLATION; LASER PROJECTIONS; MASS FABRICATIONS; MICROELECTRONIC DEVICES; MICROELECTRONIC FABRICATIONS; NEW COMPONENTS; OTHER APPLICATIONS; PATTERN GEOMETRIES; PATTERNING; PATTERNING METHODS; PHOTOABLATION; PHOTOABLATION ASSISTOR; PHYSICAL FORCES; PRECISE CONTROLS; QUARTZ SUBSTRATES; THRESHOLD ENERGIES;

CARBON NANOTUBES;

EID: 56249088298     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.795072     Document Type: Conference Paper

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