Measurement of nonlinear current-voltage dependence of interfacial passive layers for ferroelectric thin films

Japanese Journal of Applied Physics

Volumn 49, Issue 4 PART 1, 2010, Pages 0415031-0415034

  Chen, Zhi Hui ^a   Shen, Zhen Kui ^a   Jiang, An Quan ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BULK CERAMICS; COERCIVE FIELD; CONDUCTION MODELS; CURRENT-VOLTAGE RELATIONSHIP; DOMAIN SWITCHINGS; HIGH FIELD; INTERFACIAL LAYER; INTRINSIC COERCIVE FIELD; NONLINEAR CURRENT; PASSIVE LAYER; THERMAL ACTIVATION; VOLTAGE ESTIMATION;

COERCIVE FORCE; FERROELECTRIC THIN FILMS; FERROELECTRICITY; HYSTERESIS; HYSTERESIS LOOPS; MAGNETIC FILMS;

FERROELECTRIC FILMS;

EID: 77952627476     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.041503     Document Type: Article

References (21)

1. R. E. Jones, P. D. Maniar, J. O. Olowolafe, A. C. Campbell, and C. J. Mogab: Appl. Phys. Lett. 60 (1992) 1022.
2. V. Nagarajan, S. Prasertchoung, T. Zhao, H. Zheng, J. Ouyang, R. Ramesh, W. Tian, X. Q. Pan, D. M. Kim, and C. B. Eom: Appl. Phys. Lett. 84 (2004) 5225.
3. J. F. M. Cillessen, M. W. J. Prins, and R. M. Wolf: J. Appl. Phys. 81 (1997) 2777.
4. A. K. Tagantsev, M. Landivar, E. Colla, and N. Setter: J. Appl. Phys. 78 (1995) 2623.
5. P. K. Larsen, G. J. M. Dormans, D. J. Taylor, and P. J. Van. Veldhoven: J. Appl. Phys. 76 (1994) 2405.
6. D. P. Chu, Z. G. Zhang, P. Migliorato, B. M. McGregor, K. Ohashi, K. Hasegawa, and T. Shimoda: Appl. Phys. Lett. 81 (2002) 5204.
7. A. K. Tagantsev and I. A. Stolichnov: Appl. Phys. Lett. 74 (1999) 1326.
8. Y. Ishibashi and Y. Takagi: J. Phys. Soc. Jpn. 31 (1971) 506.
9. Y. Ishibashi: J. Phys. Soc. Jpn. 59 (1990) 4148.
10. S. Hashimoto, H. Orihara, and Y. Ishibashi: J. Phys. Soc. Jpn. 63 (1994) 1601.
11. S. M. Sze: Physics of Semiconductor Devices (Wiley, New York, 1981) 2nd ed., p. 245.
12. A. Q. Jiang, Y. Y. Lin, and T. A. Tang: J. Appl. Phys. 101 (2007) 104105.
13. A. Q. Jiang, Y. Y. Lin, and T. A. Tang: J. Appl. Phys. 102 (2007) 074118.
14. A. Q. Jiang, H. J. Lee, G. H. Kim, and C. S. Hwang: Adv. Mater. 21 (2009) 2870.
15. V. Mikhaelashvili, Y. Betzer, I. Prudnikov, M. Orenstein, D. Ritter, and G. Eisenstein: J. Appl. Phys. 84 (1998) 6747.
16. J. W. Merz: Phys. Rev. 95 (1954) 690.
17. N. Vittayakorn, S. Uttiya, G. Rujijanagul, and D. P. Cann: J. Phys. D 38 (2005) 2942.
18. V. Janovec: Czech. J. Phys. 8 (1958) 3.
19. H. F. Kay and J. W. Dunn: Philos. Mag. 7 (1962) 2027.
20. M. Dawber, P. Chandra, P. B. Littlewood, and J. F. Scott: J. Phys.: Condens. Matter 15 (2003) L393.
21. H. Morioka, K. Saito, S. Yokoyama, T. Oikawa, T. Kurosawa, and H. Funakubo: J. Mater. Sci. 44 (2009) 5318.