Kinetic roughening and mound surface growth in microcrystalline silicon thin films

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 7, Issue 3-4, 2010, Pages 533-536

  Liu, Fengzhen ^a   Li, Chaowei ^a   Zhu, Meifang ^a   Gu, Jinhua ^a   Zhou, Yuqin ^a  

^a UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AFM IMAGE; CHARACTERISTIC PEAKS; DYNAMIC SCALING; EARLY GROWTH; FILM SURFACES; GROWTH CHARACTERISTIC; HOT WIRE CHEMICAL VAPOR DEPOSITION; HYDROGEN DILUTION RATIO; HYDROGENATED MICROCRYSTALLINE SILICON; KINETIC ROUGHENING; MICROCRYSTALLINE SILICON THIN FILMS; SHADOWING EFFECTS; SI:H THIN FILM; SURFACE GROWTH;

ATOMIC FORCE MICROSCOPY; FILM GROWTH; METALLIC FILMS; MICROCRYSTALLINE SILICON; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR GROWTH; SPECTRAL DENSITY; THIN FILMS; VAPOR DEPOSITION;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77952578791     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200982734     Document Type: Conference Paper

References (15)

1. M. Kondo, A. Matsuda, Current Opin. Solid State Mater. Sci. 6, 445 (2002).
2. A.T. Krishnan, Bae Sanghoon, S.J. Fonash, Electron Device Lett. IEEE 22, 399 (2001).
3. P. Meakin, Fractals, Scaling, and Growth Far from Equilibrium (Cambridge University Press, Cambridge, 1998), p. 401.
4. T. Karabacak, Y.-P. Zhao, G.-C. Wang, T.-M. Lu, Phys. Rev. B 66, 075329 (2002).
5. D. M. Tanenbaum, A. L. Laracuente, A. C. Gallagher, Phys. Rev. B 56, 4243 (1997).
6. M. Kondo, T. Ohe, K. Saito, T. Nishimiya, A. Matsuda, J. Non-Cryst. Solids 227-230, 890 (1998).
7. G. T. Dalakos, J. L. Plawsky, P.D. Persans, J. Non-Cryst. Solids 349, 285 (2004).
8. M. Pelliccione T. Karabacak, T.-M. Lu, Phys. Rev. Lett. 96, 146105 (2006) .
9. F. Liu, Z. Sun, W. Zi, Y. Zhou, M. Zhu, J. Non. Cryst. Solids 354, 2345 (2008).
10. J. H. Yao, H. Guo, Phys. Rev. E 47, 1007 (1993).
11. Y. Ma, F. Liu, M. Zhu, J. Liu, H. Wang, Y. Yang, Y. Li, Nanotechnology 20 275201 (2009).
12. B. Zhou, F. Liu, J. Gu, Q. Zhang, Y. Zhou, M. Zhu, Thin Solid Films 501 113 (2006)
13. C. E. Richardson, Y.-B. Park, and H. A. Atwater, Phy. Rev. B 73, 245328 (2006).
14. J. Yu, and J.G. Amar, Phy. Rev. E 66, 021603 (2002).
15. M. Pelliccione and T.-M. Lu, Evolution of Thin Film Morphology: Modeling and Simulations (Springer-Verlag, Berlin, Heidelberg, 2008).