An overview of uncooled infrared sensors technology based on amorphous silicon and silicon germanium alloys

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 7, Issue 3-4, 2010, Pages 1180-1183

  Ambrosio, Roberto ^a   Moreno, Mario ^b   Mireles Jr , Jose ^a   Torres, Alfonso ^b   Kosarev, Andrey ^b   Heredia, Aurelio ^c  

^a UNIVERSIDAD AUTÓNOMA DE CIUDAD JUÁREZ   (Mexico)

^b INSTITUTO NACIONAL DE ASTROFÍSICA   (Mexico)

^c UNIVERSIDAD POPULAR AUTÓNOMA DEL ESTADO DE PUEBLA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

COMPARATIVE STUDIES; IC TECHNOLOGY; KEY FACTORS; MICROBOLOMETER; MICROBOLOMETER ARRAYS; PERFORMANCE CHARACTERISTICS; POLY-CRYSTALLINE SEMICONDUCTORS; SENSING ELEMENTS; SENSING MATERIAL; SILICON-GERMANIUM ALLOYS; STATE OF THE ART; TECHNOLOGY-BASED; THERMAL IMAGING APPLICATIONS; UNCOOLED; UNCOOLED INFRARED; VANADIUM OXIDES;

AMORPHOUS ALLOYS; AMORPHOUS SEMICONDUCTORS; BOLOMETERS; CERIUM ALLOYS; FILMS; GERMANIUM; GERMANIUM ALLOYS; INFRARED DETECTORS; INFRARED IMAGING; MOEMS; NANOCRYSTALLINE ALLOYS; PIXELS; SILICON ALLOYS; VANADIUM; VANADIUM COMPOUNDS;

AMORPHOUS SILICON;

EID: 77952574592     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200982781     Document Type: Conference Paper

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