|
Volumn 7, Issue 3-4, 2010, Pages 790-792
|
Preparations of P- and N-doped hydrogenated microcrystalline cubic silicon carbide films by VHF plasma enhanced chemical vapor deposition method for Si thin film solar cells
a
GIFU UNIVERSITY
(Japan)
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CHEMICAL VAPOR DEPOSITION METHODS;
CUBIC SILICON CARBIDE;
DARK CONDUCTIVITY;
DOPED MATERIALS;
N-DOPED;
N-TYPE DOPING;
THIN FILM SOLAR CELLS;
VHF PLASMA;
X-RAY DIFFRACTION MEASUREMENTS;
DEPOSITION;
EPITAXIAL GROWTH;
FILM PREPARATION;
HYDROGENATION;
MICROCRYSTALLINE SILICON;
NITROGEN PLASMA;
PHOSPHORUS;
PLASMA DEPOSITION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTOR DOPING;
SILICON CARBIDE;
SILICON SOLAR CELLS;
SOLAR CELLS;
THIN FILMS;
X RAY DIFFRACTION;
SEMICONDUCTING SILICON COMPOUNDS;
|
EID: 77952572866
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.200982732 Document Type: Conference Paper |
Times cited : (7)
|
References (11)
|