Effects of hydrogen dilution ratio on properties of hydrogenated nanocrystalline cubic silicon carbide films deposited by very high-frequency plasma-enhanced chemical vapor deposition

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 25-28, 2007, Pages

  Miyajima, Shinsuke ^a   Sawamura, Makoto ^a   Yamada, Akira ^a   Konaga, Makoto ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Low temperature deposition; Nanocrystalline material; Silicon carbide; Solar cell; VHF PECVD

Indexed keywords

HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE; SOLAR CELLS; VOLUME FRACTION;

LOW-TEMPERATURE DEPOSITION; MONOMETHYLSILANE; VHF-PECVD;

NANOCRYSTALLINE MATERIALS;

EID: 34547850438     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.L693     Document Type: Article

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