Modeling of kinematic diffraction from a thin silicon film illuminated by a coherent, focused X-ray nanobeam

Journal of Applied Crystallography

Volumn 43, Issue 3, 2010, Pages 587-595

  Ying, Andrew ^a   Osting, Braxton ^a   Noyan, I C ^a   Murray, Conal E ^b   Holt, Martin ^c   Maser, Jörg ^c  

^a Department of Applied Physics and Applied Mathematics ^*  (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 77952526041     PISSN: 00218898     EISSN: 16005767     Source Type: Journal    
DOI: 10.1107/S0021889810008459     Document Type: Article

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