A rigorous comparison of X-ray diffraction thickness measurement techniques using silicon-on-insulator thin films

Journal of Applied Crystallography

Volumn 42, Issue 3, 2009, Pages 401-410

  Ying, Andrew J ^a   Murray, Conal E ^b   Noyan, I C ^a  

^a Columbia University ^*  (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Accuracy; Line broadening; Scherrer equation; Silicon on insulator; Thickness; Thin films; Warren Averbach; Williamson Hall; X ray diffraction; X ray reflectivity

Indexed keywords

EID: 66249089047     PISSN: 00218898     EISSN: 16005767     Source Type: Journal    
DOI: 10.1107/S0021889809006888     Document Type: Article

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