Ultrahigh-vacuum cleaving system for sub-100-μm crystals

Review of Scientific Instruments

Volumn 81, Issue 4, 2010, Pages

  Muro, Takayuki ^a   Kato, Yukako ^a   Kinoshita, Toyohiko ^a   Watanabe, Yoshio ^a  

^a JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MICROMETER SCALE; OPTICAL MICROSCOPES; PHOTOEMISSION SPECTROSCOPY; SHARP EDGES; SILICON CRYSTAL; SMALL CRYSTALS; WORKING DISTANCES;

EMISSION SPECTROSCOPY; VACUUM;

CRYSTALS;

EID: 77952363657     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3357713     Document Type: Article

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