Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications

Journal of Applied Polymer Science

Volumn 117, Issue 4, 2010, Pages 2189-2195

  Kontziampasis, D ^a,b   Beltsios, K ^b   Tegou, E ^c   Argitis, P ^a   Gogolides, E ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b UNIVERSITY OF IOANNINA   (Greece)

^c General Chemical State Laboratory   (Greece)

Author keywords

Functionalization of polymers; Microstructure; Photoresists; Selectivity

Indexed keywords

CHLOROSILANES; EPOXY FILMS; FINE TUNING; FOURIER TRANSFORM INFRARED; FUNCTIONALIZATION OF POLYMERS; IN-SITU; LOW LEVEL; MOISTURE LEVEL; MULTIWAVELENGTH; NEGATIVE TONES; OXYGEN PLASMAS; POSITIVE-TONE; SILYLATIONS; SURFACE SILYLATION;

CHLORINE COMPOUNDS; COMPOSITE MICROMECHANICS; FUNCTIONAL POLYMERS; INFRARED LASERS; LASER INTERFEROMETRY; MICROMACHINING; MICROSTRUCTURE; OPTIMIZATION; OXYGEN; PHOTORESISTS;

POLYMERS;

CHEMICAL COMPOSITION; CROSS LINKING; EPOXY RESIN; FILM; MICROSTRUCTURE; MOISTURE; OPTIMIZATION; PLASMA TREATMENT; WATER;

EID: 77952273738     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.31644     Document Type: Article

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