Wet silylation and oxygen plasma development of photoresists: A mature and versatile lithographic process for microelectronics and microfabrication

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 5, 1996, Pages 3332-3338

  Gogolides, Evangelos ^a   Tzevelekis, Dimitrios ^a   Grigoropoulos, Spyridon ^a   Tegou, Evangelia ^a   Hatzakis, Michael ^a  

^a INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFERENTIAL SCANNING CALORIMETRY; FABRICATION; IMAGING TECHNIQUES; MICROELECTRONICS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OXYGEN; PHOTORESISTS; PLASMA APPLICATIONS; SILICON WAFERS; THERMOANALYSIS;

DRY DEVELOPMENT; MICROFABRICATION; OXYGEN PLASMA DEVELOPMENT; PATTERN TRANSFER; THERMOMECHANICAL ANALYSIS; WET SILYLATION;

PHOTOLITHOGRAPHY;

EID: 0030235034     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588532     Document Type: Article

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