Silylation of epoxy functionalised photoresists for optical, E - beam lithography and micromachining applications

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 335-338

  Tegou, E ^a   Gogolides, E ^a   Argitis, P ^a   Boudouvis, A ^b   Hatzakis, M ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; EPOXY RESINS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTERFEROMETRY; LITHOGRAPHY; SILICON; ULTRAVIOLET RADIATION;

SILYLATION;

PHOTORESISTS;

EID: 4243290374     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00077-X     Document Type: Article

References (6)

1. E. Gogolides, D. Tzevelekis, S. Grigoropoulos, E. Tegou and M. Hatzakis, J. Vac. Sci. Technol. B 14(5), 3332 (1996).
2. P. Argitis, I. Raptis, C. J. Aidinis, N. Glezos, M. Baciocchi, J. Everett and M. Hatzakis, J. Vac. Sci. Technol. B 13(6), 3030 (1995).
3. "Silicon compounds, Register & Review", B. C. Arkles, W. R. Peterson Jr. and R. Anderson, Petrarch Systems inc. Bristol Pa, USA (1982).
4. M. Hatzakis, J. M. Shaw, K. J. Stewart and L. Peekskill, US Patent No. 5 041 358 (1991).
5. th EPF Symposium on Polymeric Materials, Crete, Greece, October 1996.
6. E. Tegou, E. Gogolides and M. Hatzakis, Microelec. Eng. 35, 141-144 (1997).