Fabrication of vertical silicon nanowire photodetector arrays using nanoimprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7591, Issue , 2010, Pages

  Kim, Hongkwon ^a   Zhang, Arthur ^a   Lo, Yu Hwa ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Nanoimprint lithography; Nanowire; Photodetector; Phototransistor; Silicon

Indexed keywords

DEEP REACTIVE ION ETCHING; ENABLING TECHNOLOGIES; FABRICATED DEVICE; GAIN VALUES; HIGH DENSITY; HIGH SENSITIVITY; IMAGE ARRAY; INCIDENT LIGHT POWER; LARGE-AREA SUBSTRATES; PHOTO DETECTOR ARRAY; SILICON NANOWIRES; TOPDOWN; UV-CURING;

CURING; FABRICATION; LIGHT; NANOWIRES; OPTOELECTRONIC DEVICES; PHOTODETECTORS; PHOTOTRANSISTORS; REACTIVE ION ETCHING; TECHNOLOGY;

NANOIMPRINT LITHOGRAPHY;

EID: 77951534295     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.842276     Document Type: Conference Paper

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