Improved SiNx:H passivation for industrial emitter-wrap-through multicrystalline silicon solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2009, Pages 001761-001766

  Kumar, Prabhat ^a   Hacke, Peter ^a   Gee, James ^a  

^a Advent Solar Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIRECT PLASMA CHEMICAL VAPOR DEPOSITION; EMITTER-WRAP-THROUGH; FILL FACTOR; FRONT SURFACES; H-PASSIVATION; INTERNAL QUANTUM EFFICIENCY; MINORITY CARRIER LIFETIMES; MULTI-CRYSTALLINE SILICON SOLAR CELLS; MULTICRYSTALLINE SILICON WAFERS; PROCESS STEPS; REMOTE PLASMA CHEMICAL VAPOR DEPOSITIONS; SOLAR CELL FABRICATION;

CARRIER LIFETIME; CHEMICAL VAPOR DEPOSITION; OPEN CIRCUIT VOLTAGE; PASSIVATION; PLASMA DEPOSITION; POLYSILICON; SEMICONDUCTING SILICON COMPOUNDS; SILICON NITRIDE; SILICON SOLAR CELLS; SOLAR CELLS; SWITCHING CIRCUITS; VOLATILE ORGANIC COMPOUNDS;

SILICON WAFERS;

EID: 77951532577     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2009.5411464     Document Type: Conference Paper

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