Silicon nitride film for solar cells

Renewable Energy

Volumn 33, Issue 10, 2008, Pages 2289-2293

  El amrani, A ^a   Menous, I ^a   Mahiou, L ^a   Tadjine, R ^b   Touati, A ^a   Lefgoum, A ^a  

^a L'Unite de Developpement de la Technologie du Silicium   (Algeria)

^b CENTRE DE DÉVELOPPEMENT DES TECHNOLOGIES AVANCÉES   (Algeria)

Author keywords

Anti reflection coating; Passivation; PECVD; Silicon nitride

Indexed keywords

PARAMETER ESTIMATION; PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; SOLAR CELLS;

ANTI-REFLECTION COATING; OPTIMUM DEPOSITION PARAMETERS;

METALLIC FILMS;

METALLIC FILMS; PARAMETER ESTIMATION; PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; SOLAR CELLS;

COATING; FILM; NITROGEN COMPOUND; PERFORMANCE ASSESSMENT; PHOTOVOLTAIC SYSTEM; PLASMA; SILICON; SOLAR POWER;

EID: 43049177731     PISSN: 09601481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.renene.2007.12.015     Document Type: Article

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