Adsorption properties of fluorocarbon thin films prepared by physical vapor deposition methods

Surface and Coatings Technology

Volumn 204, Issue 16-17, 2010, Pages 2803-2807

  Iwamori, Satoru ^a   Tanabe, Tomoya ^a   Yano, Satoshi ^a   Noda, Kazutoshi ^b  

^a KANAZAWA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Plasma enhanced vacuum evaporation; Poly(tetrafluoroethylene); Quartz crystal microbalance; RF sputtering; Thin film

Indexed keywords

[CARBONYL; ADSORPTION PROPERTIES; AROMATIC GROUP; FILM SURFACES; FLUOROCARBON THIN FILMS; GAS SENSORS; GOLD ELECTRODES; HIGH SENSITIVITY; HYDROXYL GROUPS; LOW SENSITIVITY; METHYL SALICYLATE; NON-POLAR SOLVENTS; POLAR COMPONENTS; POLAR SOLVENTS; RF-SPUTTERING; SURFACE FREE ENERGY;

ACETONE; ADSORPTION; ALDEHYDES; DEPOSITION; ETHANOL; FILM PREPARATION; FREE ENERGY; GOLD COATINGS; GOLD DEPOSITS; ORGANIC SOLVENTS; OXIDE MINERALS; PHYSICAL VAPOR DEPOSITION; PIEZOELECTRIC DEVICES; POLYTETRAFLUOROETHYLENES; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; THIN FILMS; TOLUENE; VACUUM;

VACUUM EVAPORATION;

EID: 77951294566     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.02.041     Document Type: Article

References (16)

1. Noda K., Naganawa R., Kanekiyo Y., Tao H. Chem. Lett. 2003, 32:1128.
2. Mintova S., Bein T. Microporous Mesoporous Mater. 2001, 50:159.
3. Zhang J., Hu J., Zhu Z.Q., Gong H., O'Shea S.J. Colloids Surf. A: Physicochem. Eng. Aspects 2004, 236:23.
4. Atashbar M.Z., Bejcek B., Vijh A., Singamaneni S. Sens. Actuators B: Chem. 2005, 107:945.
5. Uemura A., Yano S., Iwamori S., Noda K. Mater. Sci. Technol. 2008, 45:143. [in Japanese].
6. Yamada Y., Kurobe T. Jpn. J. Appl. Phys. 1993, 32:5090.
7. Biederman H. Vacuum 2000, 59:594.
8. Iwamori S., Yamada Y., Ono Y., Ikeda K. Adhesion Aspects of Thin Films 2007, volume 3:21. VSP, Utrecht. K.L. Mittal (Ed.).
9. Iwamori S., Kezuka K., Uemura A. J. Soc. Mater. Sci. Jpn. 2008, 57:611. [in Japanese].
10. Simon C.M., Kaminsky W. Polym. Degrad. Stab. 1998, 62:1.
11. Choukourov A., Hanuš J., Kousal J., Grinevich A., Pihosh Y., Slavínská D., Biederman H. Vacuum 2006, 80:923.
12. Iwamori S., Hasegawa N., Uemura A. Surf. Coat. Technol. 2008, 203:59.
13. Bodas D.S., Mandale A.B., Gangal S.A. Appl. Surf. Sci. 2005, 245:202.
14. Biederman H., Zeuner M., Zalman J., Bílková P., Slavínská D., Stelmasuk V., Boldyreva A. Thin Solid Films 2001, 392:208.
15. Iwamori S., Kezuka K., Uemura A. Mol. Cryst. Liq. Cryst. 2007, 471:99.
16. Sauerbrey G. Z. Phys. 1959, 155:206.