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Volumn 396, Issue 8, 2010, Pages 2871-2879

Detection of negative ions in glow discharge mass spectrometry for analysis of solid specimens

(9) Canulescu, Stela a Molchan, Igor S b Tauziede, C c Tempez, Agnes c Whitby, J A a Thompson, George E b Skeldon, Peter b Chapon, P c Michler, Johann a

a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY (Switzerland)

b UNIVERSITY OF MANCHESTER (United Kingdom)

c HORIBA Jobin Yvon Inc (United States)

Author keywords

(XPS|XRF|EDX); Anodic tantala; Fluorine ions; Mass spectrometry ICP MS; Negative ions; Pulsed discharge; RF glow discharge mass spectrometry; Thin films

Indexed keywords

FLUORINE IONS; MASS SPECTROMETRY/ICP-MS; PULSED DISCHARGE; RF GLOW DISCHARGE; XPS;

ARGON; EMISSION SPECTROSCOPY; FLUORINE; GLOW DISCHARGES; MASS SPECTROMETERS; MASS SPECTROMETRY; METAL ANALYSIS; NEON; OPTICAL EMISSION SPECTROSCOPY; POSITIVE IONS; SIGNAL DETECTION; SMELTING; TANTALUM; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

NEGATIVE IONS;

EID: 77951294541 PISSN: 16182642 EISSN: 16182650 Source Type: Journal
DOI: 10.1007/s00216-009-3366-8 Document Type: Article

Times cited : (15)

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