Comparative investigation of the Si/SiO2 interface layer containing SiC crystallites using spectroscopic ellipsometry, ion beam analysis and XPS

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 5, 2008, Pages 1337-1340

  Lohner, T ^a   Pongracz A ^a   Khanh N Q ^a   Krafcsik, O H ^b   Josepovits, K V ^c   Deak P ^d  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^b KPE Kraft Project Electronics Ltd   (Hungary)

^c BUDAPEST UNIVERSITY OF TECHNOLOGY AND ECONOMICS   (Hungary)

^d UNIVERSITY OF BREMEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON CONTENT; CRYSTALLINE SI; DETECTION ANGLE; ELLIPSOMETRIC DATA; INTERFACE LAYER; ION BEAM ANALYSIS; LAYER THICKNESS; SCATTERING CROSS SECTION; SI SUBSTRATES; SI/SIO2; SPECTROELLIPSOMETRY; XPS;

CRYSTALLITES; ION BEAMS; IONS; SILICON CARBIDE; SPECTROSCOPIC ANALYSIS; SPECTROSCOPIC ELLIPSOMETRY;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77951106861     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200777791     Document Type: Conference Paper

References (26)

1. N. Nordell, S. G. Andersson, and A. Schöner, Inst. Phys. Conf. Ser. 81, 142 (1996).
2. O. H. Krafcsik, K. V. Josepovits, L. Tóth, B. Pécz, and P. Deák, J. Electrochem. Soc. 149, G297 (2002).
3. O. H. Krafcsik, K. V. Josepovits, and P. Deák, Mater. Sci. Forum 659, 353 (2000).
4. P. Petrik, E. Vázsonyi, M. Fried, J. Volk, G. T. Andrews, A. L. Tóth, Cs. Daróczi, I. Bársony, and J. Gyulai, phys. stat. sol. (c) 2, 3319 (2005).
5. S. Strehlke, S. Bastide, O. Polgár, M. Fried, and C. Levy-Clement, J. Electrochem. Soc. 147, 636 (2000).
6. É. Vázsonyi, G. Battistig, Z. E. Horváth, M. Fried, G. Kádár, F. Pászti, J. L. Cantin, D. Vanhaeren, L. Stalmans, and J. Poortmans, J. Porous Mater. 7, 57 (2000).
7. W. Lehnert, P. Petrik, C. Schneider, L. Pfitzner, and H. Ryssel, in: D. G. Seiler, A. C. Diebold, W. M. Bullis, T. J. Shaffner, R. McDonald, and E. J. Walters (Eds.), Characterization and Metrology for ULSI Technology, AIP Conf. Proc. 449, 336 (1998).
8. P. Petrik and C. Schneider, Vacuum 61, 427 (2001).
9. J. Volk, M. Fried, O. Polgár, and I. Bársony, phys. stat. sol. (a) 197, 208 (2003).
10. E. D. Palik, Handbook of Optical Constants of Solids (Academic Press, Orlando, 1985), p. 587.
11. E. D. Palik, Handbook of Optical Constants of Solids (Academic Press, Orlando, 1985), p. 552.
12. E. D. Palik, Handbook of Optical Constants of Solids (Academic Press, Orlando, 1985), p. 749.
13. D. E. Aspnes, Thin Solid Films 89, 249 (1982).
14. W. K. Chu, J. W. Mayer, M.-A. Nicolet, Backscattering Spectrometry (Academic Press, New York, 1978).
15. A. F. Gurbich, Nucl. Instrum. Methods B 161-163, 125 (2000).
16. D. Gracin, M. Jaksic, I. Bogdanovic-Radovic, Z. Medunic, T. Car, and B. Pracek, Vacuum 67, 519 (2002).
17. S.-S. Chang and A. Sakai, Mater. Lett. 58, 1212 (2004).
18. M. B. Yu, Rusli, S. F. Yoon, S. J. Xu, K. Chew, J. Cui, J. Ahn, and Q. Zhang, Thin Solid Films 377/378, 177 (2000).
19. G. Vida, V. K. Josepovits, M. Györ, and P. Deák , Microsc. Microanal. 9, 1 (2003).
20. K. Kovács, V. K. Josepovits, G. Kiss, H. Zillgen, and P. Deák, phys. stat. sol. (a) 193, R1 (2002).
21. SOPRA, 26rue Pierre-Joigneaux, F-92270 Bois-Colombes, France
22. E. Kótai, Nucl. Instrum. Meth. Phys. Res. B 85, 5260 (1994).
23. P. Briggs and M. P. Seah (Eds.), Practical Surface Analysis - Auger and X-ray Photoelectron Spectroscopy, 2nd ed. (Wiley Interscience, 1990).
24. N. K. Huang, Q. Xiong, and D. Z. Wang, J. Nucl. Mater. 321, 152 (2003).
25. X. L. Wu, Y. Gu, S. J. Xiong, J. M. Zhu, G. S. Huang, X. M. Bao, and G. Siu, J. Appl. Phys. 94, 5247 (2003).
26. J. L. Sullivan, S. O. Saied, and I. Bertoti, Vacuum 42, 120 (1991).