Coating of TiO2 thin films on particles by a plasma chemical vapor deposition process

Advanced Powder Technology

Volumn 21, Issue 2, 2010, Pages 136-140

  Kim, Dong Joo ^a   Kang, Jin Yi ^a   Kim, Kyo Seon ^a  

^a Kangwon National University   (South Korea)

Author keywords

Particle coating; Particle growth; Plasma chemical vapor deposition process; Rotating inductively coupled plasma reactor; TiO2 thin films

Indexed keywords

INDUCTIVELY COUPLED PLASMA REACTOR; PARTICLE COATINGS; PARTICLE GROWTH; PLASMA CHEMICAL VAPOR DEPOSITION; TIO; TIO2 THIN FILMS;

CHEMICAL VAPOR DEPOSITION; COATINGS; COUPLED CIRCUITS; ELECTROMAGNETIC INDUCTION; GLASS; GRANULAR MATERIALS; HEAT TREATMENT; INDUCTIVELY COUPLED PLASMA; PLASMA DEPOSITION; ROTATION; THIN FILMS;

DEPOSITION;

EID: 77951005590     PISSN: 09218831     EISSN: 15685527     Source Type: Journal    
DOI: 10.1016/j.apt.2009.12.014     Document Type: Article

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