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Volumn 518, Issue 14, 2010, Pages 3646-3649

Effects of Laser in situ annealing on crystal quality of NiSi film grown on Si(001) substrate

Author keywords

Electron beam evaporation; Laser annealing; Nickel silicide; NiSi; Raman spectroscopy

Indexed keywords

CRYSTAL QUALITIES; ELECTRON BEAM EVAPORATION; IN-SITU ANNEALING; LASER ANNEALING; LASER POWER; NICKEL SILICIDE; NISI FILMS; SI (001) SUBSTRATE; STRUCTURAL PHASE TRANSITION;

EID: 77950545100     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.09.084     Document Type: Article
Times cited : (5)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.