Micro-Raman study of iridium silicides

Journal of Raman Spectroscopy

Volumn 33, Issue 2, 2002, Pages 80-83

  Almendra, A ^a   Rodriguez A ^b   Rodriguez T ^b   Martin P ^a   Jimenez J ^a  

^a UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

^b UNIVERSIDAD DE VALLADOLID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

IRIDIUM; IRIDIUM COMPOUNDS; RAMAN SCATTERING; RAPID THERMAL ANNEALING; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

CHARACTERIZATION METHODS; HIGH SPATIAL RESOLUTION; MICRO-RAMAN SPECTRUM; MICRO-RAMAN STUDIES; PHONON BANDS; RUTHERFORD BACKSCATTERING SPECTROMETRY; SI SUBSTRATES; SIMPLE++; THREE PHASE; THREE PHASIS;

SILICIDES;

IRIDIUM; SILICON;

ARTICLE; FILM; RAMAN SPECTROMETRY; SPECTRAL SENSITIVITY; TEMPERATURE; THICKNESS;

EID: 0036079417     PISSN: 03770486     EISSN: None     Source Type: Journal    
DOI: 10.1002/jrs.824     Document Type: Article

References (14)