Carbon incorporation in chemical vapor deposited aluminum oxide films

Thin Solid Films

Volumn 518, Issue 14, 2010, Pages 3658-3663

  Schmidt, Benjamin W ^a   Rogers, Bridget R ^a   Gren, Cameron K ^b   Hanusa, Timothy P ^b  

^a VANDERBILT UNIVERSITY   (United States)

^b VANDERBILT UNIVERSITY   (United States)

Author keywords

Aluminum Oxide; Auger Electron Spectroscopy; Carbon; Chemical Vapor Deposition; Dimethylaluminum Isopropoxide; X ray Photoelectron Spectroscopy

Indexed keywords

ALUMINUM OXIDE; ALUMINUM OXIDE THIN FILMS; ALUMINUM OXIDES; CARBON BONDING; CARBON CONTENT; CARBON INCORPORATION; CHEMICAL NATURE; CHEMICAL VAPOR DEPOSITED; DEPOSITION TEMPERATURES; FILM-SUBSTRATE INTERFACES; HIGH VACUUM; ISO-PROPOXIDE; METAL CARBIDES; SI (100) SUBSTRATE; TEMPERATURE RANGE;

ALUMINUM; ALUMINUM COATINGS; AUGER ELECTRON SPECTROSCOPY; AUGERS; CARBIDES; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; CRACKING (CHEMICAL); DEPOSITION; ELECTRONS; OXIDE FILMS; OXIDES; OXYGEN; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SUBSTRATES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77950538981     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.09.105     Document Type: Article

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