Aluminum dimethylisopropoxide decomposition and the growth of dense alumina thin films at low temperature

Chemical Vapor Deposition

Volumn 8, Issue 5, 2002, Pages 193-195

  Battiston, Giovanni A ^a   Gerbasi, Rosalba ^a  

^a CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ALUMINA; DECOMPOSITION; DIFFUSION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROLYSIS; LIGHT SCATTERING; LOW TEMPERATURE EFFECTS; METALLIC FILMS; REACTION KINETICS;

ALUMINA THIN FILMS; DIFFUSION-CONTROLLED REGIMES; LOW DEPOSITION TEMPERATURE; REACTING GASES;

THIN FILMS;

EID: 0039486690     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(20020903)8:5<193::AID-CVDE193>3.0.CO;2-H     Document Type: Article

References (8)

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4. F. Teyssandier, M. D. Allendorf, in Proc. XIV Int. Conf. and EUROCVD11 (Eds. M. D. Allendorf, C. Bernard), The Electrochemical Society, Pennington NJ 1997, p. 15.
5. J Arndt, G. Wahl, in Proc XIV Int. Conf. and EVROCVD11 (Eds. M. D Allendorf, C. Bernard). The Electrochemical Society, Pennington, NJ 1997, p 147.
6. R. Raghavan, D. C. Lee, D. A. Conrad, P. W. Morrison, Jr , Abstracts 197th Meeting of The Electrochemical Society, The Electrochemical Society, Pennington, NJ 2000, p. 850.
7. D. L. Smith, Thin-Film Deposition. Principles & Practice, McGraw Hill, New York 1995.
8. L J Bellamy, The Infrared Spectra of Complex Molecules, Chapman and Hall, London 1975.