Tribological properties of the Ti-Al-N thin films with different components fabricated by double-targeted co-sputtering

Applied Surface Science

Volumn 256, Issue 13, 2010, Pages 4272-4279

  Li, Xuechao ^a   Li, Changsheng ^a   Zhang, Ye ^a   Tang, Hua ^a   Li, Guowei ^a   Mo, Chaochao ^a  

^a JIANGSU UNIVERSITY   (China)

Author keywords

Double targeted reactive magnetron sputtering technique; Heat treatment; Ti Al N films; Tribological performance

Indexed keywords

ALUMINUM NITRIDE; AMORPHOUS FILMS; FRICTION; HEAT TREATMENT; III-V SEMICONDUCTORS; MAGNETRON SPUTTERING; METALLIC FILMS; TRIBOLOGY; WEAR OF MATERIALS;

AFTER-HEAT TREATMENT; CHEMICAL COMPOSITIONS; ELEVATED TEMPERATURE; REACTIVE MAGNETRON SPUTTERING; TI-AL-N FILMS; TRIBOLOGICAL BEHAVIORS; TRIBOLOGICAL PERFORMANCE; TRIBOLOGICAL PROPERTIES;

THIN FILMS;

EID: 77950516006     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.02.014     Document Type: Article

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