메뉴 건너뛰기




Volumn 43, Issue 7, 2008, Pages 709-712

The influence of N2 flow rate and substrate temperature on Ti1-xAlxN thin films

Author keywords

DC magnetron sputtering; Nano crystalline; Thin film; Titanium aluminium nitride

Indexed keywords

ALUMINUM; ALUMINUM COMPOUNDS; FLOW RATE; FRICTION; GRAIN SIZE AND SHAPE; MAGNETRONS; NITRIDES; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SUBSTRATES; SURFACE PROPERTIES; SURFACE ROUGHNESS; THICK FILMS; THIN FILMS; TITANIUM; TITANIUM NITRIDE; X RAY ANALYSIS;

EID: 54949113934     PISSN: 02321300     EISSN: 15214079     Source Type: Journal    
DOI: 10.1002/crat.200711122     Document Type: Article
Times cited : (2)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.