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Volumn 43, Issue 7, 2008, Pages 709-712
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The influence of N2 flow rate and substrate temperature on Ti1-xAlxN thin films
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Author keywords
DC magnetron sputtering; Nano crystalline; Thin film; Titanium aluminium nitride
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Indexed keywords
ALUMINUM;
ALUMINUM COMPOUNDS;
FLOW RATE;
FRICTION;
GRAIN SIZE AND SHAPE;
MAGNETRONS;
NITRIDES;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON;
SUBSTRATES;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
THICK FILMS;
THIN FILMS;
TITANIUM;
TITANIUM NITRIDE;
X RAY ANALYSIS;
ATOMIC FORCES;
DC MAGNETRON SPUTTERING;
DEPOSITED FILMS;
GRAIN SIZES;
NANO CRYSTALLINE;
REACTIVE DC MAGNETRON SPUTTERING;
SILICON (111) SUBSTRATE;
SUBSTRATE TEMPERATURES;
TITANIUM ALUMINIUM NITRIDE;
TITANIUM ALUMINIUM NITRIDES;
X-RAY DIFFRACTIONS;
MAGNETRON SPUTTERING;
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EID: 54949113934
PISSN: 02321300
EISSN: 15214079
Source Type: Journal
DOI: 10.1002/crat.200711122 Document Type: Article |
Times cited : (2)
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References (14)
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