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Thin Solid Films

Volumn 332, Issue 1-2, 1998, Pages 423-427

Characterization of multilayered Ti/TiN films grown by chemical vapor deposition

(5) Hu, J C a Chang, T C b Chen, L J a Yang, Y L b Chang, C Y c

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

b NATIONAL NANO DEVICE LABORATORIES (Taiwan)

c NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

LPCVD TiN; Multilayered Ti TiN film; PECVD Ti; Plasma post treatment

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHLORINE; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; HIGH TEMPERATURE EFFECTS; MULTILAYERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAPID THERMAL ANNEALING; SECONDARY ION MASS SPECTROMETRY; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

MULTILAYERED FILMS;

SEMICONDUCTING FILMS;

EID: 0032476365 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)01018-9 Document Type: Article

Times cited : (24)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.