Effect of N2 partial pressure on the microstructure and mechanical properties of reactively sputtered (Ti,Al)N coatings

Materials Letters

Volumn 59, Issue 17, 2005, Pages 2210-2213

  Mei, Fanghua ^a   Shao, Nan ^a   Wei, Lun ^a   Li, Geyang ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

(Ti,Al)N coating; Mechanical property; Microstructure; Reactive sputtering

Indexed keywords

COATING TECHNIQUES; COMPOSITION; MECHANICAL PROPERTIES; MICROSTRUCTURE; PRESSURE EFFECTS; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY SPECTROSCOPY;

(TI,AL)N COATINGS; DEPOSITION RATE; NANOINDENTOR; REACTIVE SPUTTERING;

NITROGEN;

EID: 18544375618     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2005.02.068     Document Type: Article

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