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Volumn 19, Issue 5-6, 2010, Pages 413-417

Extreme insulating ultrathin diamond films for SOD applications: From coalescence modelling to synthesis

Author keywords

Chemical vapor deposition (CVD); Coalescence modelling; Diamond; Dielectrical properties; Silicon on insulator (SOD); Thin films

Indexed keywords

BURIED LAYER; DIAMOND LAYERS; DIAMOND MATERIALS; DIAMOND NANOCRYSTALS; DIELECTRICAL PROPERTIES; ELECTRICAL RESISTIVITY; FULLY DEPLETED; GROWTH PROCESS; HIGH THERMAL CONDUCTIVITY; INSULATING PROPERTIES; LINEAR GROWTH; NUCLEATION DENSITIES; POLYCRYSTALLINE DIAMOND FILMS; PROCESSING TECHNOLOGIES; SILICON ON INSULATOR; SILICON-ON-INSULATOR (SOD); SURFACE COVERAGES; ULTRA-THIN;

EID: 77950368330     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2010.01.018     Document Type: Article
Times cited : (21)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.