Influence of the growth parameters on the electrical properties of thin polycrystalline CVD diamond films

Diamond and Related Materials

Volumn 9, Issue 3, 2000, Pages 1086-1090

  Jany, C ^a   Tardieu, A ^b   Gicquel, A ^b   Bergonzo, P ^a   Foulon, F ^a  

^a CEA LETI   (France)

^b UNIVERSITÉ PARIS 13   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALPHA PARTICLES; CARRIER MOBILITY; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CURRENT VOLTAGE CHARACTERISTICS; FILM GROWTH; IRRADIATION; POLYCRYSTALLINE MATERIALS; RADIATION DETECTORS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS;

MICROWAVE POWER DENSITY;

DIAMOND FILMS;

EID: 0033738902     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00237-X     Document Type: Article

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