Effects of the deposition conditions and annealing process on the electric properties of hot-filament CVD diamond films

Journal of Crystal Growth

Volumn 274, Issue 1-2, 2005, Pages 21-27

  Zhang, Minglong ^a   Xia, Yiben ^a   Wang, Linjun ^a   Gu, Beibei ^a   Su, Qingfeng ^a   Lou, Yanyan ^a  

^a SHANGHAI UNIVERSITY   (China)

Author keywords

A1. Annealing process; A3. Chemical vapor deposited diamond films; A3. Deposition condition

Indexed keywords

ANNEALING PROCESSES; BAND GAPS; CHEMICAL VAPOR DEPOSITED DIAMOND FILMS; DEPOSITION CONDITIONS;

ANNEALING; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC PROPERTIES; RAMAN SPECTROSCOPY; THERMAL CONDUCTIVITY; X RAY DIFFRACTION ANALYSIS;

DIAMOND FILMS;

EID: 11144254445     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.09.092     Document Type: Article

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