Effect of XeF laser treatment on structure of nanocrystalline diamond films

Diamond and Related Materials

Volumn 19, Issue 5-6, 2010, Pages 445-448

  Huang, Bohr Ran ^a   Jou, Shyankay ^a   Wu, Yao Ming ^a   Chen, Kuei Hsien ^b   Chen, Li Chyong ^c  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES   (Taiwan)

^c NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Excimer laser; Nanocrystalline diamond; Raman spectrum; XPS

Indexed keywords

ENERGY DENSITY; FREE SURFACES; LASER IRRADIATIONS; MICROWAVE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; NANOCRYSTALLINE DIAMOND FILMS; NANOCRYSTALLINE DIAMONDS; NCD FILMS; OXYGEN CONTENT; PROCESS GAS; RAMAN SPECTRUM; SI SUBSTRATES; XEF LASERS; XPS;

DIAMONDS; EXCIMER LASERS; GAS LASERS; GRAIN BOUNDARIES; IRRADIATION; LASER BEAM EFFECTS; MICROWAVES; OXYGEN; OXYGENATION; PLASMA DEPOSITION; RAMAN SCATTERING; RAMAN SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

DIAMOND FILMS;

EID: 77950368217     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2010.01.028     Document Type: Article

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