Nanowhiskers formation by radio frequency Ar/O2 plasma etching of aluminum coated diamond films

Thin Solid Films

Volumn 515, Issue 9, 2007, Pages 4172-4176

  Li, C Y ^a,b   Hatta, A ^a  

^a KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b HARBIN ENGINEERING UNIVERSITY   (China)

Author keywords

Al coating; Anisotropic etching; Diamond nanowhiskers; RF plasma

Indexed keywords

ALUMINUM; ANISOTROPY; ARGON; COATINGS; CRYSTAL WHISKERS; ENERGY DISPERSIVE SPECTROSCOPY; NANOSTRUCTURED MATERIALS; PLASMA ETCHING;

ANISOTROPIC ETCHING; COATING TIME; DIAMOND NANOWHISKERS; RF PLASMA;

DIAMOND FILMS;

EID: 33847028400     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.02.089     Document Type: Article

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