Effect of triode structure on field emission properties of nanocrystalline diamond films

Diamond and Related Materials

Volumn 18, Issue 2-3, 2009, Pages 235-237

  Huang, Bohr Ran ^a   Wu, Te He ^b   Jou, Shyankay ^a   Chen, Wei Ru ^b   Hsu, Jung Fu ^c   Yeh, Chun Shin ^b,d  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^c CHUNG CHOU INSTITUTE OF TECHNOLOGY   (Taiwan)

^d CHIENKUO TECHNOLOGY UNIVERSITY   (Taiwan)

Author keywords

Diamond films; Field emission; Nanocrystalline; Triode structure

Indexed keywords

ALUMINA; CARBON NANOTUBES; DIAMOND CUTTING TOOLS; DIAMONDS; ELECTRIC FIELDS; EMISSION SPECTROSCOPY; FIELD EMISSION; FIELD EMISSION CATHODES; LITHIUM COMPOUNDS; MICROWAVES; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS; NANOCRYSTALLINE SILICON; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTORY METAL COMPOUNDS; SCANNING ELECTRON MICROSCOPY; TRIODES;

ALUMINUM FILMS; CHEMICAL STRUCTURES; COMB LIKES; FIELD EMISSION PROPERTIES; FIELD EMITTERS; FIELD ENHANCEMENT FACTORS; GATE ELECTRODES; GATE VOLTAGES; MICROWAVE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITIONS; NANOCRYSTALLINE; NANOCRYSTALLINE DIAMOND FILMS; NANOCRYSTALLINE DIAMONDS; REACTANT GAS; SCANNING ELECTRONS; SILICON SUBSTRATES; TRIODE STRUCTURE; TURN-ON ELECTRIC FIELDS;

DIAMOND FILMS;

EID: 59849095026     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.10.062     Document Type: Article

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