Ion beam etching of CVD diamond film in Ar, Ar/O2 and Ar/CF4 gas mixtures

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 833-836

  Leech, P W ^a,d   Reeves, G K ^b   Holland, A S ^b   Shanks, F ^c  

^a CSIRO   (Australia)

^b RMIT UNIVERSITY   (Australia)

^c MONASH UNIVERSITY   (Australia)

^d Private Bag 33 ^*  (Australia)

Author keywords

Diamond films; Ion beam etching

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ETCHING; SPUTTERING;

ETCH RATES;

DIAMOND FILMS;

ACOUSTIC FILTER; DIAMOND; ETCHING; FILM; MECHANICAL PROPERTY; VAPOR DEPOSITION;

EID: 0036508484     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00605-7     Document Type: Article

References (17)