Growth and characterization of molybdenum oxide thin films prepared by photochemical metal-organic deposition (PMOD)

Polyhedron

Volumn 29, Issue 6, 2010, Pages 1551-1554

  Buono Core, G E ^a   Cabello, G ^b   Klahn, A H ^a   Lucero, A ^a   Nunez M V ^a   Torrejon B ^a   Castillo, C ^a  

^a PONTIFICIA UNIVERSIDAD CATÓLICA DE VALPARAÍSO   (Chile)

^b UNIVERSIDAD DEL BÍO BÍO   (Chile)

Author keywords

Molybdenum oxides; Photochemical deposition; Thin films

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; ANNEALING; ATOMIC FORCE MICROSCOPY; DEPOSITION; FILM PREPARATION; IRRADIATION; MOLYBDENUM OXIDE; ORGANOMETALLICS; OXIDE FILMS; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ACETYLACETONATE COMPLEXES; ATOMIC-FORCE-MICROSCOPY; NONSTOICHIOMETRIC; PHOTO-DEPOSITED FILMS; PHOTOCHEMICAL DEPOSITION; PHOTOCHEMICAL METAL-ORGANIC DEPOSITION; SI(1 0 0); THIN-FILMS; UV IRRADIATION; X- RAY DIFFRACTIONS;

THIN FILMS;

EID: 77949913598     PISSN: 02775387     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.poly.2010.01.036     Document Type: Article

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