Optical properties of chemical vapor deposited thin films of molybdenum and tungsten based metal oxides

Solar Energy Materials and Solar Cells

Volumn 76, Issue 4, 2003, Pages 563-576

  Gesheva, K ^a   Szekeres, A ^b   Ivanova, T ^a  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

CVD method; Electrochromism; Metal oxide thin films; Optical properties

Indexed keywords

ANNEALING; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; ELECTROCHROMISM; ELLIPSOMETRY;

METAL OXIDE THIN FILMS;

THIN FILMS;

EID: 0037398740     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(02)00267-2     Document Type: Conference Paper

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