Study of the resonant frequencies of silicon microcantilevers coated with vanadium dioxide films during the insulator-to-metal transition

Journal of Applied Physics

Volumn 107, Issue 5, 2010, Pages

  Rúa, Armando ^a,b   Fernández, Félix E ^a   Hines, Melissa A ^c   Sepúlveda, Nelson ^a  

^a UNIVERSITY OF PUERTO RICO   (Puerto Rico)

^b CITY UNIVERSITY OF NEW YORK   (United States)

^c Cornell University ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE SIZE; AVERAGE VALUES; COMPOSITE BEAM; EFFECTIVE STIFFNESS; ELASTICITY THEORY; ELECTROMECHANICAL RESONATORS; FORCED VIBRATION; HYSTERETIC BEHAVIOR; IN-SITU ANNEALING; INSULATOR-TO-METAL TRANSITIONS; MECHANICAL RESONANCE; MICRO-SCALES; MONOCLINIC PHASE; NANO SCALE; OXIDIZING ATMOSPHERE; PREFERENTIAL ORIENTATION; PROPERTY CHANGES; RESONANT FREQUENCIES; REVERSIBLE CHANGE; ROOM TEMPERATURE; SAMPLE SURFACE; SAMPLE THICKNESS; SILICON MICROCANTILEVERS; TETRAGONAL PHASE; VANADIUM DIOXIDE; VANADIUM DIOXIDE FILM; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES; YOUNG'S MODULUS;

ANNEALING; COMPOSITE MICROMECHANICS; DEPOSITION; ELASTICITY; ELECTROMECHANICAL DEVICES; HYSTERESIS; METAL ANALYSIS; METAL INSULATOR TRANSITION; NANOCANTILEVERS; NATURAL FREQUENCIES; PULSED LASER DEPOSITION; PULSED LASERS; SEMICONDUCTING SILICON COMPOUNDS; STIFFNESS; STRESSES; SUBSTRATES; THIN FILMS; ULTRASONIC DELAY LINES; VANADIUM; VANADIUM ALLOYS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTALLITE SIZE;

EID: 77949770437     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3309749     Document Type: Article

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