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Applied Physics A: Materials Science and Processing

Volumn 84, Issue 1-2, 2006, Pages 63-66

All-optical characterization of single femtosecond laser-pulse-induced amorphization in silicon

(1) Bonse, J a,b

a INSTITUTO DE ÓPTICA (Spain)

b MAX BORN INSTITUT (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; LASER ABLATION; MICROSCOPIC EXAMINATION; PULSED LASER APPLICATIONS; SINGLE CRYSTALS; THIN FILMS;

FEMTOSECOND LASERS; OPTICAL IMAGING; SCANNING LASER MICROSCOPY;

SILICON;

EID: 33646695264 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-006-3583-3 Document Type: Article

Times cited : (52)

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