Femtosecond pulse laser processing of TiN on silicon

Applied Surface Science

Volumn 154, Issue , 2000, Pages 659-663

  Bonse, J ^a   Rudolph, P ^a   Kruger J ^a   Baudach, S ^a   Kautek, W ^a  

^a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LASER ABLATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; OPTICAL PROPERTIES; PULSED LASER APPLICATIONS; SILICON WAFERS; SPUTTER DEPOSITION; SURFACE STRUCTURE; TITANIUM NITRIDE; ULTRAFAST PHENOMENA;

DIRECT FOCUSING TECHNIQUES;

CERAMIC COATINGS;

EID: 0033906172     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00481-X     Document Type: Article

References (13)

1. Sundgren J.-E., Hentzell H.T.G. J. Vac. Sci. Technol., A. 4:1986;2259.
2. Michalowsky L. Neue keramische Werkstoffe. 1. Auflage:1994;Deutscher Verlag für Grundstoffindustrie, Leipzig.
3. Born M., Wolf E. Principles of Optics. 6th edn. 1980;Cambridge Univ. Press.
4. Matthias E., Reichling M., Siegel J., Käding O.W., Petzoldt S., Skurk H., Bizenberger P., Neske E. Appl. Phys. A. 58:1994;129.
5. Jandeleit J., Urbasch G., Hoffmann H.D., Treusch H.-G., Kreutz E.W. Appl. Phys. A. 63:1996;117.
6. Jee Y., Becker M.F., Walser R.M. J. Opt. Soc. Am. B. 5:1988;648.
7. Kautek W., Krüger J. SPIE. 2207:1994;600.
8. Herbst G., Steiner M., Marowsky G., Matthias E. Mat. Res. Soc. Symp. Proc. 397:1996;69.
9. Chichkov B.N., Momma C., Nolte S., von Alvensleben F., Tünnermann A. Appl. Phys. A. 63:1996;109.
10. Pedraza A.J., Fowlkes J.D., Lowndes D.H. Appl. Phys. Lett. 74:1999;2322.
11. Güdde J., Hohlfeld J., Müller J.G., Matthias E. Appl. Surf. Sci. 127-129:1998;40.
12. Preuss S., Demchuk A., Stuke M. Appl. Phys. A. 61:1995;33.
13. J. Bonse, M. Geuß, S. Baudach, H. Sturm, J. Krüger, W. Kautek, Poster No. 41, presented at 5th International Conference on Laser Ablation (COLA 99), Göttingen, July 19-23 1999, Appl. Phys. A, in press.