Incorporation of a photonic layer at the metallization levels of a CMOS circuit

IEEE International Conference on Group IV Photonics GFP

Volumn , Issue , 2006, Pages 200-202

  Fedeli, J M ^a   Migette, M ^a   Di Cioccio, L ^a   El Melhaoui, L ^a   Orobtchouk, R ^b   Seassal, C ^c   Rojo Romeo, P ^c   Mandorlo, F ^c   Marris Morini, D ^d   Vivien, L ^d  

^a CEA LETI   (France)

^b INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

^c ECOLE CENTRALE DE LYON   (France)

^d UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS CIRCUITS; LOW-TEMPERATURE FABRICATION; METALLIZATIONS; PHOTONIC CIRCUITS;

CMOS INTEGRATED CIRCUITS; METALLIZING; WAFER BONDING;

PHOTONICS;

EID: 34248650195     PISSN: 19492081     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

1. nd International Conference on GroupIV Photonics
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3. A. Lupu and al "Experimental demonstration of the superprim effect in the SOI photonic technology" Optics 5690 Vol 12 no23 15 November 2004
4. R. Orobtchouk, S.Jeannot, T. Benyattou, J. M. Fedeli, P.Mur "Ultracompact optical link made in amorphous silicon waveguide", proceeding of Photonics Europe 2006 paper 6183-04
5. H.Hattori et al., "Heterogeneous Integration of Microdisk Lasers on Silicon Strip Waveguides for Optical Interconnects", to appear in Photonics Technology Letters
6. J. Van Campenhout et al. "An electrically driven membrane microdisk laser for the integration of photonic and electronic ICs" postdeadline paper, LEOS annual meeting, Sydney, 2005