Thermoelectric hydrogen sensors using Si and SiGe thin films with a catalytic combustor

Journal of the Ceramic Society of Japan

Volumn 118, Issue 1375, 2010, Pages 188-192

  Nishibori, Maiko ^a   Shin, Woosuck ^a   Izu, Noriya ^a   Itoh, Toshio ^a   Matsubara, Ichiro ^a   Watanabe, Nobuyuki ^a,b   Kasuga, Toshihiro ^a,b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Catalyst combustion; Hydrogen sensor; Si thin film; Thermoelectric

Indexed keywords

CATALYSTS; CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; COMBUSTION; COMBUSTORS; DEPOSITION; MICROSENSORS; SEEBECK COEFFICIENT; SILICON; SILICON ALLOYS; VAPOR DEPOSITION; VOLTAGE MEASUREMENT;

CATALYTIC COMBUSTORS; CHEMICAL VAPOR DEPOSITION METHODS; HYDROGEN SENSOR; SENSOR PERFORMANCE; THERMOELECTRIC; THERMOELECTRIC HYDROGEN SENSORS; THERMOELECTRIC PROPERTIES; THERMOELECTRIC THIN FILMS;

THIN FILMS;

EID: 77949525366     PISSN: 18820743     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj2.118.188     Document Type: Article

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