Formation of ZnO nanostructures in energy-controlled hollow-type magnetron RF plasma

Thin Solid Films

Volumn 518, Issue 13, 2010, Pages 3522-3525

  Kumeta, Keisuke ^a   Ono, Hideki ^a   Iizuka, Satoru ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Magnetron plasma; RF plasma sputtering; Vertically aligned nanorods; Zinc oxide

Indexed keywords

AR PLASMAS; DEPOSITION TIME; DISCHARGE PARAMETERS; FILM MORPHOLOGY; GAS FLOWRATE; GAS-FLOW RATIO; MAGNETRON PLASMAS; OPTICAL EMISSION INTENSITY; RF PLASMA; RF PLASMA SPUTTERING; RF-POWER; SEM; SPUTTERING RATE; SUBSTRATE TEMPERATURE; TARGET VOLTAGE; TOTAL PRESSURE; VERTICALLY ALIGNED; VERTICALLY ALIGNED NANORODS; ZNO NANOSTRUCTURES;

AERODYNAMICS; BIAS VOLTAGE; CHEMICAL VAPOR DEPOSITION; FLOW OF GASES; MAGNETRONS; NANORODS; OXYGEN; PLASMA THEORY; RAMAN SPECTROSCOPY; SPUTTERING; TARGETS; WAVE PLASMA INTERACTIONS; ZINC; ZINC OXIDE;

ELECTRIC DISCHARGES;

EID: 77949460766     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.11.048     Document Type: Article

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