Formation of nanoparticles by control of electron temperature in hollow-typed magnetron radio frequency CH4/H2 plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 B, 2006, Pages 8071-8074

  Emi, Junichi ^a   Kato, Kohgi ^b   Abe, Toshimi ^c   Iizuka, Satoru ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b Sendai Digital Techno   (Japan)

^c TOHOKU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

CH4 H2 plasma; Diamond; Graphite; Low electron temperature plasma; Nanoparticle

Indexed keywords

DEPOSITION; ELECTRONS; MAGNETRON SPUTTERING; THERMAL EFFECTS; THIN FILMS;

LOW-ELECTRON-TEMPERATURE PLASMA; MAGNETRON RADIO FREQUENCY (RF);

NANOPARTICLES;

EID: 34247619930     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.8071     Document Type: Article

References (11)

1. F. J. G. Vazquez and J. M. Albella: J. Appl. Phys. 94 (2003) 6085.
2. J. Robertson: Mater. Sci. Eng. R 37 (2002) 129.
3. A. Kimura, H. Kodama and T. Suzuki: J. Vac. Sci. Technol. A 21 (2003) 515.
4. Y. B. Guo and F. C. N. Hong: Diamond Relat. Mater. 12 (2003) 946.
5. Y. Ohgoe, K. K. Hirakuri, K. Tsuchimoto, G. Friedbacher and O. Miyashita: Surf. Cort. Technol. 184 (2004) 263.
6. S. Iizuka and N. Sato: Electr. Eng. Jpn. 130 (2000) 1.
7. T. Shimizu, S. Iizuka, K. Kato and N. Sato: Plasma Sources Sci. Technol. 12 (2003) 821.
8. R. Ikada, G. Nishimura, K. Kato and S. Iizuka: Thin Solid Films 457 (2004) 55.
9. R. Ikada and S. Iizuka: Diamond Relat Mater. 14 (2005) 446.
10. K. Kato, S. Iizuka and N. Sato: Appl. Phys. Lett 65 (1994) 816.
11. K. Kato, T. Shimizu, S. Iizuka and N. Sato: Appl. Phys. Lett. 76 (2000) 547.