Fast and smooth etching of indium tin oxides in BCl3 / Cl 2 inductively coupled plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 2, 2010, Pages 189-192

  Andagana, H B ^a   Cao, X A ^a  

^a West Virginia University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINITIES; ETCH RATES; ETCH RESISTANCE; ETCHED SURFACE; ETCHING CHARACTERISTICS; ETCHING PROCESS; GAS-FLOW RATIO; HIGH ETCH RATE; INDIUM TIN OXIDE; INDIUM TIN OXIDE FILMS; ITO FILMS;

DESORPTION; ETCHING; INDIUM; INDUCTIVELY COUPLED PLASMA; OXIDE FILMS; PHOTORESISTS; TIN; TIN OXIDES; TITANIUM COMPOUNDS;

ITO GLASS;

EID: 77949368177     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3280919     Document Type: Article

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