Dry etching of ITO by magnetic pole enhanced inductively coupled plasma for display and biosensing devices

Applied Surface Science

Volumn 252, Issue 10, 2006, Pages 3861-3870

  Meziani, T ^a   Colpo, P ^a   Lambertini, V ^b   Ceccone, G ^a   Rossi, F ^a  

^a JOINT RESEARCH CENTRE   (Italy)

^b CENTRO RICERCHE FIAT   (Italy)

Author keywords

Atomic force microscopy; Indium tin oxide; Ion etching; Plasma processing; Sputtering; X ray photoelectron spectroscopy

Indexed keywords

BIOSENSORS; ETCHING; INDUCTIVELY COUPLED PLASMA; METHANE;

INDIUM TIN OXIDE; ION ETCHING; PLASMA PROCESSING;

INDIUM COMPOUNDS;

EID: 32644451228     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.06.010     Document Type: Article

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