Influence of sputtering atmosphere on crystallinity and crystal orientation of AIN thin films deposited on polycrystalline MoSi2 substrates

Journal of Materials Science

Volumn 33, Issue 9, 1998, Pages 2463-2467

  Akiyama, M ^a   Xu, C ^a   Nonaka, K ^a   Hagio, T ^a   Nishimura, S ^a   Shobu, K ^a   Watanabe, T ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION EFFECTS; CRYSTAL ORIENTATION; MAGNETRON SPUTTERING; MOLYBDENUM COMPOUNDS; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; PRESSURE EFFECTS; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM NITRIDE; CRYSTALLINITY;

ALUMINUM COMPOUNDS;

EID: 0032069722     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004376429400     Document Type: Article

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